imec, Belgium, to install ASML EXE:5200 High NA EUV lithography system
On March 18, imec announced the arrival of the ASML EXE:5200 High NA EUV lithography system. It will empower imec and its ecosystem partners to unlock the performance needed to pioneer sub-2nm logic and high-density memory technologies that will fuel the rapid growth of advanced AI and high-performance computing.
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